GLOW-DISCHARGE DEPOSITION OF CHLORINATED AND HYDROGENATED AMORPHOUS-SILICON FILMS FROM SICL4-SIH4

被引：13

作者：

DANESH, P ^{[1
]}

GEORGIEV, S ^{[1
]}

JAHN, U ^{[1
]}

机构：

[1] FRIEDRICH SCHILLER UNIV,SEKT PHYS,DDR-6900 JENA,GER DEM REP

来源：

SOLAR ENERGY MATERIALS | 1984年 / 9卷 / 04期

关键词：

D O I：

10.1016/0165-1633(84)90015-7

中图分类号：

TE [石油、天然气工业]; TK [能源与动力工程];

学科分类号：

0807 ; 0820 ;

摘要：

引用

页码：405 / 413

页数：9

共 15 条

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[2]

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[7] OPTICAL AND ELECTRICAL-PROPERTIES OF CHLORINATED AND HYDROGENATED AMORPHOUS-SILICON PREPARED BY GLOW-DISCHARGE [J].

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[8] EFFECTS OF INERT-GAS DILUTION OF SILANE ON PLASMA-DEPOSITED A-SI-H FILMS [J].

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[9] INFLUENCE OF HALIDES ON THE PHOTOCONDUCTIVITY, DARK CONDUCTIVITY AND PHOTO-LUMINESCENCE OF A-SI-H [J].

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[10] CHEMICAL EFFECTS ON THE FREQUENCIES OF SI-H VIBRATIONS IN AMORPHOUS SOLIDS [J].

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