ION-BASED METHODS FOR OPTICAL THIN-FILM DEPOSITION

被引：295

作者：

MARTIN, PJ

机构：

来源：

JOURNAL OF MATERIALS SCIENCE | 1986年 / 21卷 / 01期

关键词：

D O I：

10.1007/BF01144693

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：1 / 25

页数：25

共 148 条

[81]

MATSKEVICH LL, 1979, SOV J OPT TECHNOL+, V46, P179

[82]

MATTOX DM, 1965, J VAC SCI TECHNOL, V2, P283

[83] FUNDAMENTALS OF ION PLATING [J].

MATTOX, DM .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (01) :47-52

[84] STRUCTURE MODIFICATION BY ION-BOMBARDMENT DURING DEPOSITION [J].

MATTOX, DM ;

KOMINIAK, GJ .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (01) :528-&

[85] ION-ASSISTED DEPOSITION OF OPTICAL THIN-FILMS - LOW-ENERGY VS HIGH-ENERGY BOMBARDMENT [J].

MCNEIL, JR ;

BARRON, AC ;

WILSON, SR ;

HERRMANN, WC .

APPLIED OPTICS, 1984, 23 (04) :552-559

[86]

MESSIER R, APPL SURF SCI

[87] THERMALIZATION OF SPUTTERED ATOMS [J].

MEYER, K ;

SCHULLER, IK ;

FALCO, CM .

JOURNAL OF APPLIED PHYSICS, 1981, 52 (09) :5803-5805

[88] CO-SPUTTERED OPTICAL FILMS [J].

MISIANO, C ;

SIMONETTI, E .

VACUUM, 1977, 27 (04) :403-406

[89]

MISIANO C, 1983, 9 P INT VAC C 5 INT, P132

[90] PREPARATION AND STRUCTURE OF CARBON-FILM DEPOSITED BY A MASS-SEPARATED C+ ION-BEAM [J].

MIYAZAWA, T ;

MISAWA, S ;

YOSHIDA, S ;

GONDA, S .

JOURNAL OF APPLIED PHYSICS, 1984, 55 (01) :188-193

← 4 5 6 7 8 9 10 11 12 13 →