ELECTROMIGRATION IN ALUMINUM FILMS PREPARED WITH A HIGH-RATE MAGNETRON SPUTTERING CATHODE

被引：9

作者：

PARK, YH

ROESSLE, P

MAJEWSKI, E

SMITH, JF

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1985年 / 3卷 / 06期

关键词：

D O I：

10.1116/1.572870

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：2308 / 2311

页数：4

共 12 条

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[10] ELECTROMIGRATION IN SPUTTERED AL-CU THIN-FILMS [J].

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