INFLUENCE OF LATERAL CHARGE INHOMOGENEITIES IN MOS STRUCTURES ON THE DETERMINATION OF THE INTERFACE STATE DENSITY DISTRIBUTION FROM HF CV CURVES

被引:4
作者
FENSKE, F
机构
来源
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1983年 / 79卷 / 02期
关键词
D O I
10.1002/pssa.2210790212
中图分类号
T [工业技术];
学科分类号
08 ;
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页码:417 / 421
页数:5
相关论文
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