HYSTERESIS EFFECT IN REACTIVE RF SPUTTERING AND THE ADJUSTMENT OF THE SET POINT FOR STOICHIOMETRIC FILM DEPOSITION

被引：11

作者：

SEIFARTH, H

机构：

来源：

THIN SOLID FILMS | 1989年 / 172卷 / 01期

关键词：

D O I：

10.1016/0040-6090(89)90118-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：61 / 69

页数：9

共 18 条

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