A KINETICS STUDY OF THE ATMOSPHERIC-PRESSURE CVD REACTION OF SILANE AND NITROUS-OXIDE

被引：25

作者：

CHAPPLESOKOL, JD

GIUNTA, CJ

GORDON, RG

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1989年 / 136卷 / 10期

关键词：

D O I：

10.1149/1.2096390

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

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页码：2993 / 3003

页数：11

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