THE SPECIFIC CONTACT RESISTANCE OF OHMIC CONTACTS TO HGTE/HG1-XCDXTE HETEROSTRUCTURES

被引:6
作者
LEECH, PW
机构
[1] Telecom Australia Research Laboratories, Clayton
关键词
D O I
10.1063/1.346733
中图分类号
O59 [应用物理学];
学科分类号
摘要
The specific contact resistance (ρc) of Ohmic contacts to HgTe/Hg0.4Cd0.6Te heterostructures has been measured using a transmission line model. The lowest measured values of ρc (1.7×10-3 Ω cm2) corresponded to the In/HgTe/Hg 0.4Cd0.6Te and Sn/HgTe/Hg0.4Cd 0.6Te systems; while within the range of the other metal contacts examined (Ag, Al, Au, Cr, Cu, Ni, Pt, and Ti), ρc was independent of HgTe/Hg0.4Cd0.6Te interface reactivity. Comparative measurements have also been made with metal junctions formed to Hg 0.4Cd0.6Te and HgTe.
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页码:907 / 909
页数:3
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