SURFACE-STATE DENSITY DISTRIBUTION AT AN AL2O3-INP METAL-INSULATOR-SEMICONDUCTOR FIELD-EFFECT TRANSISTOR MEASURED BY THE CHARGE PUMPING TECHNIQUE

被引：3

作者：

KOBAYASHI, T

ICHIKAWA, T

SAWAI, T

机构：

来源：

APPLIED PHYSICS LETTERS | 1986年 / 49卷 / 06期

关键词：

D O I：

10.1063/1.97612

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：351 / 353

页数：3

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