EFFECTS OF 2-STEP ANNEALING ON THE EPITAXIAL-GROWTH OF COSI2 ON SILICON

被引：15

作者：

CHEN, LJ

CHANG, TT

机构：

来源：

THIN SOLID FILMS | 1983年 / 104卷 / 1-2期

关键词：

D O I：

10.1016/0040-6090(83)90560-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

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页码：183 / 189

页数：7

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