OXIDATION MECHANISMS IN HIGH-PRESSURE DC-SPUTTERED A-SI FILMS

被引：13

作者：

KOROPECKI, RR

ARCE, R

DEBERNARDEZ, LS

BUITRAGO, R

机构：

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1985年 / 74卷 / 01期

关键词：

D O I：

10.1016/0022-3093(85)90395-3

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：11 / 17

页数：7

共 13 条

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[10] INFLUENCE OF OXYGEN AND DEPOSITION CONDITIONS ON SPUTTERED A-SI [J].

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