ENHANCEMENT OF REACTIVE SPUTTERING RATE OF TIO2 USING A PLANAR AND DUAL ROTATABLE CYLINDRICAL MAGNETRONS

被引：3

作者：

BELKIND, A ^{[1
]}

WOLFE, J ^{[1
]}

机构：

[1] AIRCO COATING TECHNOL, CONCORD, CA 94524 USA

来源：

THIN SOLID FILMS | 1994年 / 248卷 / 02期

关键词：

D O I：

10.1016/0040-6090(94)90006-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

TiO2 was reactively sputtered using a combination of a planar and two cylindrical rotatable magnetrons. Using separate argon and oxygen introduction into the system, the planar magnetron was run in the metallic mode while the rotatables were in the oxide mode. In this case, the deposition rate was about three times higher than that obtained running only the two cylindrical rotatable magnetrons in the oxide mode.

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页码：165 / 165

页数：1

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