EFFECTS OF DIFFERENTIAL ETCHING AND MASKING RESIST PREPARATION ON THE QUALITY OF THE REACTIVE-ION-ETCHED ALUMINUM AND ALUMINUM-ALLOYS

被引：1

作者：

CHANG, SC

机构：

来源：

JOURNAL OF ELECTRONIC MATERIALS | 1984年 / 13卷 / 06期

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D O I：

10.1007/BF02655310

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

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页码：955 / 967

页数：13

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