EFFECTS OF DISCHARGE PARAMETERS ON DEPOSITION RATE OF HYDROGENATED AMORPHOUS-SILICON FOR SOLAR-CELLS FROM PURE SIH4 PLASMA

被引：16

作者：

ISHIHARA, S ^{[1
]}

KITAGAWA, M ^{[1
]}

HIRAO, T ^{[1
]}

WASA, K ^{[1
]}

ARITA, T ^{[1
]}

MORI, K ^{[1
]}

机构：

[1] MATSUSHITA BATTERY IND CO, TECHNOL LAB, MORIGUCHI, OSAKA 570, JAPAN

来源：

JOURNAL OF APPLIED PHYSICS | 1987年 / 62卷 / 02期

关键词：

D O I：

10.1063/1.339771

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：485 / 491

页数：7

共 31 条

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