200-KV MASS-SEPARATED FINE FOCUSED ION-BEAM APPARATUS

被引：13

作者：

SHIOKAWA, T

KIM, PH

TOYODA, K

NAMBA, S

GAMO, K

AIHARA, R

ANAZAWA, N

机构：

[1] OSAKA UNIV,FAC ENGN SCI,TOYONAKA,OSAKA 560,JAPAN

[2] JEOL LTD,TOKYO 196,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1985年 / 24卷 / 07期

关键词：

D O I：

10.1143/JJAP.24.L566

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：L566 / L568

页数：3

共 18 条

[11] A 100 KV MASKLESS ION-IMPLANTATION SYSTEM WITH AN AU-SI-BE LIQUID-METAL ION-SOURCE FOR III-V-COMPOUND SEMICONDUCTORS [J].

MIYAUCHI, E ;

ARIMOTO, H ;

HASHIMOTO, H ;

FURUYA, T ;

UTSUMI, T .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1983, 22 (05) :L287-L288

[12] PRESSURE AND IRRADIATION ANGLE DEPENDENCE OF MASKLESS ION-BEAM ASSISTED ETCHING OF GAAS AND SI [J].

OCHIAI, Y ;

GAMO, K ;

NAMBA, S .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01) :67-70

[13] HIGH-INTENSITY SCANNING ION PROBE WITH SUBMICROMETER SPOT SIZE [J].

SELIGER, RL ;

WARD, JW ;

WANG, V ;

KUBENA, RL .

APPLIED PHYSICS LETTERS, 1979, 34 (05) :310-312

[14] 100 KEV FOCUSED ION-BEAM SYSTEM WITH A EXB MASS FILTER FOR MASKLESS ION-IMPLANTATION [J].

SHIOKAWA, T ;

KIM, PH ;

TOYODA, K ;

NAMBA, S ;

MATSUI, T ;

GAMO, K .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04) :1117-1120

[15] 30 NM LINE FABRICATION ON PMMA RESIST BY FINE FOCUSED BE ION-BEAM [J].

SHIOKAWA, T ;

AOYAGI, Y ;

KIM, PH ;

TOYODA, K ;

NAMBA, S .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1984, 23 (04) :L232-L233

[16] EMISSION CHARACTERISTICS OF GALLIUM AND BISMUTH LIQUID-METAL FIELD-ION SOURCES [J].

SWANSON, LW ;

SCHWIND, GA ;

BELL, AE ;

BRADY, JE .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06) :1864-1867

[17] HIGH-DOSE RATE EFFECT OF FOCUSED-ION-BEAM BORON IMPLANTATION INTO SILICON [J].

TAMURA, M ;

SHUKURI, S ;

ISHITANI, T ;

ICHIKAWA, M ;

DOI, T .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1984, 23 (06) :L417-L420

[18] A MASS-SEPARATING FOCUSED-ION-BEAM SYSTEM FOR MASKLESS ION-IMPLANTATION [J].

WANG, V ;

WARD, JW ;

SELIGER, RL .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04) :1158-1163

← 1 2 →