EFFECT OF THIN GE LAYER ON THE SURFACE DEPLETION IN GAAS

被引:9
作者
MUI, DSL [1 ]
SALVADOR, A [1 ]
STRITE, S [1 ]
MORKOC, H [1 ]
机构
[1] UNIV ILLINOIS,COORDINATED SCI LAB,URBANA,IL 61801
关键词
D O I
10.1063/1.103624
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have investigated thin GaAs layers capped with 20 Å Ge pertaining to the extent of the well known surface depletion layer in this semiconductor. Using the transmission line method, the effective surface potential of 0.78 V measured in the GaAs surface was reduced to 0.45 V by the epitaxially grown Ge cap layer. About 0.26 of the 0.45 V is due to the conduction-band discontinuity at the Ge/GaAs heterointerface which leads to an actual surface potential of around 0.19 V. The same trend was also verified by photoreflectance and photoluminescence with variable excitation wavelengths. The results are encouraging for device applications despite the possibility that a considerable portion of the 20 Å Ge cap layer is oxidized.
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页码:572 / 574
页数:3
相关论文
共 11 条
[1]   THIRD-DERIVATIVE MODULATION SPECTROSCOPY WITH LOW-FIELD ELECTROREFLECTANCE [J].
ASPNES, DE .
SURFACE SCIENCE, 1973, 37 (01) :418-442
[2]   CONCENTRATION-DEPENDENCE OF ABSORPTION-COEFFICIENT FOR N-TYPE AND P-TYPE GAAS BETWEEN 1.3 AND 1.6 EV [J].
CASEY, HC ;
SELL, DD ;
WECHT, KW .
JOURNAL OF APPLIED PHYSICS, 1975, 46 (01) :250-257
[3]   INDEPENDENCE OF FERMI-LEVEL POSITION AND VALENCE-BAND EDGE DISCONTINUITY AT GAAS-GE(100) INTERFACES [J].
CHIARADIA, P ;
KATNANI, AD ;
SANG, HW ;
BAUER, RS .
PHYSICAL REVIEW LETTERS, 1984, 52 (14) :1246-1249
[4]   VARIATION OF N-GAAS (100) INTERFACE FERMI LEVEL BY GE AND SI OVERLAYERS [J].
GRANT, RW ;
WALDROP, JR .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (04) :1015-1019
[5]   CONTROL OF COMPOUND SEMICONDUCTOR INSULATOR INTERFACES BY AN ULTRATHIN MOLECULAR-BEAM EPITAXY SI LAYER [J].
HASEGAWA, H ;
AKAZAWA, M ;
ISHII, H ;
MATSUZAKI, K .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (04) :870-878
[6]   ELECTRICAL-PROPERTIES OF GALLIUM ARSENIDE-INSULATOR INTERFACE [J].
MEINERS, LG .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (04) :1402-1407
[7]   PHOTOREFLECTANCE MEASUREMENTS OF UNINTENTIONAL IMPURITY CONCENTRATIONS IN UNDOPED GAAS [J].
SYDOR, M ;
ANGELO, J ;
MITCHEL, W ;
HAAS, TW ;
YEN, MY .
JOURNAL OF APPLIED PHYSICS, 1989, 66 (01) :156-160
[8]   PHOTOREFLECTANCE AND THE ELECTRIC-FIELDS IN A GAAS DEPLETION REGION [J].
SYDOR, M ;
ENGHOLM, JR ;
MANASREH, MO ;
STUTZ, CE ;
LIOU, L ;
EVANS, KR .
APPLIED PHYSICS LETTERS, 1990, 56 (18) :1769-1771
[9]  
Sze S.M, 1981, SEMICONDUCTOR DEVICE
[10]   ELECTRICAL CHARACTERISTICS OF P+-GE/(N-GAAS AND N-ALGAAS) JUNCTIONS AND THEIR APPLICATIONS TO GE BASE TRANSISTORS [J].
UNLU, MS ;
STRITE, S ;
GAO, GB ;
ADOMI, K ;
MORKOC, H .
APPLIED PHYSICS LETTERS, 1990, 56 (09) :842-844