LASER-INDUCED DRY-CLEANING IN AIR - A NEW SURFACE CLEANING TECHNOLOGY IN LIEU OF CARBON FLUOROCHLORIDE (CFC) SOLVENTS

被引：23

作者：

LU, YF ^{[1
]}

AOYAGI, Y ^{[1
]}

机构：

[1] RIKEN, INST PHYS & CHEM RES, SEMICOND LAB, WAKO, SAITAMA 35101, JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1994年 / 33卷 / 3B期

关键词：

LASER CLEANING; DRY PROCESS; CFC-FREE CLEANING; UV PULSE LASER; SURFACE CLEANING; MAGNETIC HEAD CLEANING; FINGERPRINT REMOVAL; METAL SURFACE CLEANING;

D O I：

10.1143/JJAP.33.L430

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Surface contaminations are removed by laser irradiation with pulse output and short wavelength. It is a new dry cleaning process to remove surface organic contaminations without using ultrasonic cleaning with carbon fluorochloride (CFC) and other organic solvents. This provides a new dry process to clean different substrate surfaces and can take the place of conventional wet cleaning processes such as ultrasonic cleaning with CFC and other organic solvents. The mechanisms of laser cleaning may include laser photodecomposition, laser ablation and surface vibration due to the impact of laser pulse.

引用

页码：L430 / L433

页数：4

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