DC ELECTRICAL-CONDUCTIVITY OF AMORPHOUS SI3N4-C COMPOSITES PREPARED BY CHEMICAL VAPOR-DEPOSITION

被引:7
作者
GOTO, T
HIRAI, T
机构
关键词
D O I
10.1007/BF00560626
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:383 / 390
页数:8
相关论文
共 17 条
[1]   OPTICAL-PROPERTIES, BAND-GAP, AND SURFACE-ROUGHNESS OF SI3N4 [J].
BAUER, J .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1977, 39 (02) :411-418
[2]   SOME PROPERTIES OF VAPOR DEPOSITED SILICON NITRIDE FILMS USING SIH4-NH3-H2 SYSTEM [J].
BEAN, KE ;
GLEIM, PS ;
YEAKLEY, RL ;
RUNYAN, WR .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1967, 114 (07) :733-&
[3]   PROPERTIES OF SIXOYNZ FILMS ON SI [J].
BROWN, DM ;
GRAY, PV ;
HEUMANN, FK ;
PHILIPP, HR ;
TAFT, EA .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1968, 115 (03) :311-&
[5]  
CHEN SH, 1981, 3RD P INT CARB C PIO, P44
[6]  
ELMER TH, 1976, AM CERAM SOC BULL, V55, P999
[7]  
GOTO T, 1981, SCI REP RES TOHOKU A, V29, P176
[8]  
Goto T., UNPUB
[9]   DENSITY AND DEPOSITION RATES OF AMORPHOUS CVD-SI3N4 INCLUDING CARBON [J].
HIRAI, T ;
GOTO, T .
JOURNAL OF MATERIALS SCIENCE, 1981, 16 (10) :2877-2882
[10]   PREPARATION OF AMORPHOUS SI3N4-C PLATE BY CHEMICAL VAPOR-DEPOSITION [J].
HIRAI, T ;
GOTO, T .
JOURNAL OF MATERIALS SCIENCE, 1981, 16 (01) :17-23