PHENOMENA PRODUCED BY ION-BOMBARDMENT IN PLASMA-ASSISTED ETCHING ENVIRONMENTS

被引：30

作者：

WINTERS, HF

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 03期

关键词：

D O I：

10.1116/1.575225

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1997 / 2000

页数：4

共 29 条

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[6]

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