PHOTOSENSITIVE AZIDE-PMMA MODIFIED RESIST

被引：6

作者：

HAN, CC

CORELLI, JC

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1987年 / 134卷 / 04期

关键词：

D O I：

10.1149/1.2100565

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1036 / 1037

页数：2

共 11 条

[1] AZIDE-PHENOLIC RESIN PHOTORESISTS FOR DEEP UV LITHOGRAPHY [J].

IWAYANAGI, T ;

KOHASHI, T ;

NONOGAKI, S ;

MATSUZAWA, T ;

DOUTA, K ;

YANAZAWA, H .

IEEE TRANSACTIONS ON ELECTRON DEVICES, 1981, 28 (11) :1306-1310

[2] DEEP UV LITHOGRAPHY [J].

LIN, BJ .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06) :1317-1320

[3]

NONOGAKI S, 1985, P SOC PHOTO-OPT INST, V539, P189, DOI 10.1117/12.947834

[4] APPLICATION OF POLYMER BISAZIDE COMPOSITE SYSTEM NEGATIVE RESISTS TO ELECTRON-BEAM LITHOGRAPHY [J].

TANIGAKI, K ;

SUZUKI, M ;

OHNISHI, Y .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (06) :1594-1599

[5]

TOMIOKA H, 1985, P SOC PHOTO-OPT INST, V539, P151, DOI 10.1117/12.947828

[6] A PRINCIPLE FOR THE FORMULATION OF PLASMA DEVELOPABLE RESISTS AND THE IMPORTANCE OF DRY DEVELOPMENT OF SUB-MICRON LITHOGRAPHY [J].

TSUDA, M ;

OIKAWA, S ;

KANAI, W ;

YOKOTA, A ;

HIJIKATA, I ;

UEHARA, A ;

NAKANE, H .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (02) :259-261

[7] PMIPK-AZIDE DRY-DEVELOPABLE RESIST IN ELECTRON-BEAM LITHOGRAPHY [J].

TSUDA, M ;

OIKAWA, S ;

YABUTA, M ;

YAKOTA, A ;

NAKANE, H ;

YAMASHITA, K ;

GAMO, K ;

NAMBA, S .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (02) :481-484

[8] A HIGHLY-SENSITIVE DRY DEVELOPABLE RESIST [J].

TSUDA, M ;

OIKAWA, S ;

YABUTA, M ;

YOKOTA, A ;

NAKANE, H .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1984, 23 (02) :259-264

[9] HIGH-REMAINING DRY-DEVELOPED RESIST PATTERNS OF STEEP PROFILE [J].

TSUDA, M ;

YOKOTA, A ;

KASHIWAGI, K ;

YABUTA, M ;

OIKAWA, S ;

KANAI, W ;

NAKANE, H .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1983, 22 (07) :1215-1220

[10] NOVEL PLASMA DEVELOPABLE RESIST COMPOSITIONS AND PERFORMANCE OF TOTAL DRY MICROFABRICATIONS IN SUB-MICRON LITHOGRAPHY [J].

TSUDA, M ;

OIKAWA, S ;

KANAI, W ;

HASHIMOTO, K ;

YOKOTA, A ;

NUINO, K ;

HIJIKATA, I ;

UEHARA, A ;

NAKANE, H .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04) :1351-1357

← 1 2 →