PROPERTIES OF AL2O3 FILMS DEPOSITED FROM ALCL3, CO2, AND H-2 SYSTEM

被引：38

作者：

SILVESTRI, VJ

OSBURN, CM

ORMOND, DW

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1978年 / 125卷 / 06期

关键词：

D O I：

10.1149/1.2131588

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：902 / 907

页数：6

共 21 条

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[9] INFLUENCE OF DEPOSITION TEMPERATURE ON PROPERTIES OF HYDROLYTICALLY GROWN ALUMINUM OXIDE FILMS [J].

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