INTERACTIONS OF THIN TI FILMS WITH SI, SIO2, SI3N4, AND SIOXNY UNDER RAPID THERMAL ANNEALING

被引:105
作者
MORGAN, AE
BROADBENT, EK
RITZ, KN
SADANA, DK
BURROW, BJ
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D O I
10.1063/1.341434
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O59 [应用物理学];
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页码:344 / 353
页数:10
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