TITANIUM SILICON AND SILICON DIOXIDE REACTIONS CONTROLLED BY LOW-TEMPERATURE RAPID THERMAL ANNEALING

被引：25

作者：

BRILLSON, LJ ^{[1
]}

SLADE, ML ^{[1
]}

RICHTER, HW ^{[1
]}

VANDERPLAS, H ^{[1
]}

FULKS, RT ^{[1
]}

机构：

[1] XEROX CORP,PALO ALTO RES CTR,PALO ALTO,CA 94304

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1986年 / 4卷 / 03期

关键词：

D O I：

10.1116/1.573772

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：993 / 997

页数：5

共 24 条

[1] GROWTH AND STRUCTURE OF TITANIUM SILICIDE PHASES FORMED BY THIN TI FILMS ON SI CRYSTALS
BENTINI, GG
NIPOTI, R
ARMIGLIATO, A
BERTI, M
DRIGO, AV
COHEN, C
[J]. JOURNAL OF APPLIED PHYSICS, 1985, 57 (02) : 270 - 275
[2] TITANIUM SILICIDE FORMATION - EFFECT OF OXYGEN DISTRIBUTION IN THE METAL-FILM
BERTI, M
DRIGO, AV
COHEN, C
SIEJKA, J
BENTINI, GG
NIPOTI, R
GUERRI, S
[J]. JOURNAL OF APPLIED PHYSICS, 1984, 55 (10) : 3558 - 3565
[3] THERMODYNAMIC CONSIDERATIONS IN REFRACTORY METAL-SILICON-OXYGEN SYSTEMS
BEYERS, R
[J]. JOURNAL OF APPLIED PHYSICS, 1984, 56 (01) : 147 - 152
[4] PHASE-EQUILIBRIA IN THIN-FILM METALLIZATIONS
BEYERS, R
SINCLAIR, R
THOMAS, ME
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1984, 2 (04): : 781 - 784
[5] REDUCTION OF SILICON-ALUMINUM INTERDIFFUSION BY IMPROVED SEMICONDUCTOR SURFACE ORDERING
BRILLSON, LJ
SLADE, ML
KATNANI, AD
KELLY, M
MARGARITONDO, G
[J]. APPLIED PHYSICS LETTERS, 1984, 44 (01) : 110 - 112
[6] SURFACE SEGREGATION IN CU-NI AND CU-PT ALLOYS - COMPARISON OF LOW-ENERGY ION-SCATTERING RESULTS WITH THEORY
BRONGERSMA, HH
SPARNAAY, MJ
BUCK, TM
[J]. SURFACE SCIENCE, 1978, 71 (03) : 657 - 678
[7] CHEMICAL AND STRUCTURAL ASPECTS OF REACTION AT THE TI SI INTERFACE
BUTZ, R
RUBLOFF, GW
TAN, TY
HO, PS
[J]. PHYSICAL REVIEW B, 1984, 30 (10): : 5421 - 5429
[8] CHEMICAL BONDING AND REACTIONS AT TI/SI AND TI/OXYGEN/SI INTERFACES
BUTZ, R
RUBLOFF, GW
HO, PS
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (02): : 771 - 775
[9] TITANIUM SILICIDE FORMATION ON BF2+-IMPLANTED SILICON
CHOW, TP
KATZ, W
SMITH, G
[J]. APPLIED PHYSICS LETTERS, 1985, 46 (01) : 41 - 43
[10] RAPID ISOTHERMAL ANNEALING OF ION-IMPLANTATION DAMAGE USING A THERMAL-RADIATION SOURCE
FULKS, RT
RUSSO, CJ
HANLEY, PR
KAMINS, TI
[J]. APPLIED PHYSICS LETTERS, 1981, 39 (08) : 604 - 606

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