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A NEW MOSFET WITH LARGE-TILT-ANGLE IMPLANTED DRAIN (LATID) STRUCTURE
被引:24
作者
:
HORI, T
论文数:
0
引用数:
0
h-index:
0
HORI, T
KURIMOTO, K
论文数:
0
引用数:
0
h-index:
0
KURIMOTO, K
机构
:
来源
:
IEEE ELECTRON DEVICE LETTERS
|
1988年
/ 9卷
/ 06期
关键词
:
D O I
:
10.1109/55.723
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
引用
收藏
页码:300 / 302
页数:3
相关论文
共 11 条
[1]
ASYMMETRICAL CHARACTERISTICS IN LDD AND MINIMUM-OVERLAP MOSFETS
[J].
CHAN, TY
论文数:
0
引用数:
0
h-index:
0
机构:
FAIRCHILD RES CTR,PALO ALTO,CA 94304
FAIRCHILD RES CTR,PALO ALTO,CA 94304
CHAN, TY
;
WU, AT
论文数:
0
引用数:
0
h-index:
0
机构:
FAIRCHILD RES CTR,PALO ALTO,CA 94304
FAIRCHILD RES CTR,PALO ALTO,CA 94304
WU, AT
;
KO, PK
论文数:
0
引用数:
0
h-index:
0
机构:
FAIRCHILD RES CTR,PALO ALTO,CA 94304
FAIRCHILD RES CTR,PALO ALTO,CA 94304
KO, PK
;
HU, CM
论文数:
0
引用数:
0
h-index:
0
机构:
FAIRCHILD RES CTR,PALO ALTO,CA 94304
FAIRCHILD RES CTR,PALO ALTO,CA 94304
HU, CM
;
RAZOUK, RR
论文数:
0
引用数:
0
h-index:
0
机构:
FAIRCHILD RES CTR,PALO ALTO,CA 94304
FAIRCHILD RES CTR,PALO ALTO,CA 94304
RAZOUK, RR
.
IEEE ELECTRON DEVICE LETTERS,
1986,
7
(01)
:16
-19
[2]
DEPTH PROFILES OF BORON ATOMS WITH LARGE TILT-ANGLE IMPLANTATIONS
[J].
FUSE, G
论文数:
0
引用数:
0
h-index:
0
机构:
Matsushita Electric Industrial Co, Moriguchi, Jpn, Matsushita Electric Industrial Co, Moriguchi, Jpn
FUSE, G
;
UMIMOTO, H
论文数:
0
引用数:
0
h-index:
0
机构:
Matsushita Electric Industrial Co, Moriguchi, Jpn, Matsushita Electric Industrial Co, Moriguchi, Jpn
UMIMOTO, H
;
ODANAKA, S
论文数:
0
引用数:
0
h-index:
0
机构:
Matsushita Electric Industrial Co, Moriguchi, Jpn, Matsushita Electric Industrial Co, Moriguchi, Jpn
ODANAKA, S
;
WAKABAYASHI, M
论文数:
0
引用数:
0
h-index:
0
机构:
Matsushita Electric Industrial Co, Moriguchi, Jpn, Matsushita Electric Industrial Co, Moriguchi, Jpn
WAKABAYASHI, M
;
FUKUMOTO, M
论文数:
0
引用数:
0
h-index:
0
机构:
Matsushita Electric Industrial Co, Moriguchi, Jpn, Matsushita Electric Industrial Co, Moriguchi, Jpn
FUKUMOTO, M
;
OHZONE, T
论文数:
0
引用数:
0
h-index:
0
机构:
Matsushita Electric Industrial Co, Moriguchi, Jpn, Matsushita Electric Industrial Co, Moriguchi, Jpn
OHZONE, T
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1986,
133
(05)
:996
-998
[3]
A NEW ISOLATION METHOD WITH BORON-IMPLANTED SIDEWALLS FOR CONTROLLING NARROW-WIDTH EFFECT
[J].
FUSE, G
论文数:
0
引用数:
0
h-index:
0
FUSE, G
;
FUKUMOTO, M
论文数:
0
引用数:
0
h-index:
0
FUKUMOTO, M
;
SHINOHARA, A
论文数:
0
引用数:
0
h-index:
0
SHINOHARA, A
;
ODANAKA, S
论文数:
0
引用数:
0
h-index:
0
ODANAKA, S
;
SASAGO, M
论文数:
0
引用数:
0
h-index:
0
SASAGO, M
;
OHZONE, T
论文数:
0
引用数:
0
h-index:
0
OHZONE, T
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1987,
34
(02)
:356
-360
[4]
STRUCTURE-ENHANCED MOSFET DEGRADATION DUE TO HOT-ELECTRON INJECTION
[J].
HSU, FC
论文数:
0
引用数:
0
h-index:
0
HSU, FC
;
GRINOLDS, HR
论文数:
0
引用数:
0
h-index:
0
GRINOLDS, HR
.
IEEE ELECTRON DEVICE LETTERS,
1984,
5
(03)
:71
-74
[5]
Huang T., 1986, International Electron Devices Meeting 1986. Technical Digest (Cat. No.86CH2381-2), P742
[6]
SUBMICROMETER DEVICE DESIGN FOR HOT-ELECTRON RELIABILITY AND PERFORMANCE
[J].
HUI, J
论文数:
0
引用数:
0
h-index:
0
HUI, J
;
MOLL, J
论文数:
0
引用数:
0
h-index:
0
MOLL, J
.
IEEE ELECTRON DEVICE LETTERS,
1985,
6
(07)
:350
-352
[7]
A NEW SUBSTRATE AND GATE CURRENT PHENOMENON IN SHORT-CHANNEL LDD AND MINIMUM OVERLAP DEVICES
[J].
HUI, J
论文数:
0
引用数:
0
h-index:
0
HUI, J
;
HSU, FC
论文数:
0
引用数:
0
h-index:
0
HSU, FC
;
MOLL, J
论文数:
0
引用数:
0
h-index:
0
MOLL, J
.
IEEE ELECTRON DEVICE LETTERS,
1985,
6
(03)
:135
-138
[8]
OPTIMUM DESIGN OF N+-N- DOUBLE-DIFFUSED DRAIN MOSFET TO REDUCE HOT-CARRIER EMISSION
[J].
KOYANAGI, M
论文数:
0
引用数:
0
h-index:
0
KOYANAGI, M
;
KANEKO, H
论文数:
0
引用数:
0
h-index:
0
KANEKO, H
;
SHIMIZU, S
论文数:
0
引用数:
0
h-index:
0
SHIMIZU, S
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1985,
32
(03)
:562
-570
[9]
A THEORETICAL-STUDY OF GATE DRAIN OFFSET IN LDD MOSFETS
[J].
LEE, J
论文数:
0
引用数:
0
h-index:
0
LEE, J
;
MAYARAM, K
论文数:
0
引用数:
0
h-index:
0
MAYARAM, K
;
HU, CM
论文数:
0
引用数:
0
h-index:
0
HU, CM
.
IEEE ELECTRON DEVICE LETTERS,
1986,
7
(03)
:152
-154
[10]
THE EFFECT OF HIGH FIELDS ON MOS DEVICE AND CIRCUIT PERFORMANCE
[J].
SODINI, CG
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,HOLMDEL,NJ 07733
SODINI, CG
;
KO, PK
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,HOLMDEL,NJ 07733
KO, PK
;
MOLL, JL
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,HOLMDEL,NJ 07733
MOLL, JL
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1984,
31
(10)
:1386
-1393
←
1
2
→
共 11 条
[1]
ASYMMETRICAL CHARACTERISTICS IN LDD AND MINIMUM-OVERLAP MOSFETS
[J].
CHAN, TY
论文数:
0
引用数:
0
h-index:
0
机构:
FAIRCHILD RES CTR,PALO ALTO,CA 94304
FAIRCHILD RES CTR,PALO ALTO,CA 94304
CHAN, TY
;
WU, AT
论文数:
0
引用数:
0
h-index:
0
机构:
FAIRCHILD RES CTR,PALO ALTO,CA 94304
FAIRCHILD RES CTR,PALO ALTO,CA 94304
WU, AT
;
KO, PK
论文数:
0
引用数:
0
h-index:
0
机构:
FAIRCHILD RES CTR,PALO ALTO,CA 94304
FAIRCHILD RES CTR,PALO ALTO,CA 94304
KO, PK
;
HU, CM
论文数:
0
引用数:
0
h-index:
0
机构:
FAIRCHILD RES CTR,PALO ALTO,CA 94304
FAIRCHILD RES CTR,PALO ALTO,CA 94304
HU, CM
;
RAZOUK, RR
论文数:
0
引用数:
0
h-index:
0
机构:
FAIRCHILD RES CTR,PALO ALTO,CA 94304
FAIRCHILD RES CTR,PALO ALTO,CA 94304
RAZOUK, RR
.
IEEE ELECTRON DEVICE LETTERS,
1986,
7
(01)
:16
-19
[2]
DEPTH PROFILES OF BORON ATOMS WITH LARGE TILT-ANGLE IMPLANTATIONS
[J].
FUSE, G
论文数:
0
引用数:
0
h-index:
0
机构:
Matsushita Electric Industrial Co, Moriguchi, Jpn, Matsushita Electric Industrial Co, Moriguchi, Jpn
FUSE, G
;
UMIMOTO, H
论文数:
0
引用数:
0
h-index:
0
机构:
Matsushita Electric Industrial Co, Moriguchi, Jpn, Matsushita Electric Industrial Co, Moriguchi, Jpn
UMIMOTO, H
;
ODANAKA, S
论文数:
0
引用数:
0
h-index:
0
机构:
Matsushita Electric Industrial Co, Moriguchi, Jpn, Matsushita Electric Industrial Co, Moriguchi, Jpn
ODANAKA, S
;
WAKABAYASHI, M
论文数:
0
引用数:
0
h-index:
0
机构:
Matsushita Electric Industrial Co, Moriguchi, Jpn, Matsushita Electric Industrial Co, Moriguchi, Jpn
WAKABAYASHI, M
;
FUKUMOTO, M
论文数:
0
引用数:
0
h-index:
0
机构:
Matsushita Electric Industrial Co, Moriguchi, Jpn, Matsushita Electric Industrial Co, Moriguchi, Jpn
FUKUMOTO, M
;
OHZONE, T
论文数:
0
引用数:
0
h-index:
0
机构:
Matsushita Electric Industrial Co, Moriguchi, Jpn, Matsushita Electric Industrial Co, Moriguchi, Jpn
OHZONE, T
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1986,
133
(05)
:996
-998
[3]
A NEW ISOLATION METHOD WITH BORON-IMPLANTED SIDEWALLS FOR CONTROLLING NARROW-WIDTH EFFECT
[J].
FUSE, G
论文数:
0
引用数:
0
h-index:
0
FUSE, G
;
FUKUMOTO, M
论文数:
0
引用数:
0
h-index:
0
FUKUMOTO, M
;
SHINOHARA, A
论文数:
0
引用数:
0
h-index:
0
SHINOHARA, A
;
ODANAKA, S
论文数:
0
引用数:
0
h-index:
0
ODANAKA, S
;
SASAGO, M
论文数:
0
引用数:
0
h-index:
0
SASAGO, M
;
OHZONE, T
论文数:
0
引用数:
0
h-index:
0
OHZONE, T
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1987,
34
(02)
:356
-360
[4]
STRUCTURE-ENHANCED MOSFET DEGRADATION DUE TO HOT-ELECTRON INJECTION
[J].
HSU, FC
论文数:
0
引用数:
0
h-index:
0
HSU, FC
;
GRINOLDS, HR
论文数:
0
引用数:
0
h-index:
0
GRINOLDS, HR
.
IEEE ELECTRON DEVICE LETTERS,
1984,
5
(03)
:71
-74
[5]
Huang T., 1986, International Electron Devices Meeting 1986. Technical Digest (Cat. No.86CH2381-2), P742
[6]
SUBMICROMETER DEVICE DESIGN FOR HOT-ELECTRON RELIABILITY AND PERFORMANCE
[J].
HUI, J
论文数:
0
引用数:
0
h-index:
0
HUI, J
;
MOLL, J
论文数:
0
引用数:
0
h-index:
0
MOLL, J
.
IEEE ELECTRON DEVICE LETTERS,
1985,
6
(07)
:350
-352
[7]
A NEW SUBSTRATE AND GATE CURRENT PHENOMENON IN SHORT-CHANNEL LDD AND MINIMUM OVERLAP DEVICES
[J].
HUI, J
论文数:
0
引用数:
0
h-index:
0
HUI, J
;
HSU, FC
论文数:
0
引用数:
0
h-index:
0
HSU, FC
;
MOLL, J
论文数:
0
引用数:
0
h-index:
0
MOLL, J
.
IEEE ELECTRON DEVICE LETTERS,
1985,
6
(03)
:135
-138
[8]
OPTIMUM DESIGN OF N+-N- DOUBLE-DIFFUSED DRAIN MOSFET TO REDUCE HOT-CARRIER EMISSION
[J].
KOYANAGI, M
论文数:
0
引用数:
0
h-index:
0
KOYANAGI, M
;
KANEKO, H
论文数:
0
引用数:
0
h-index:
0
KANEKO, H
;
SHIMIZU, S
论文数:
0
引用数:
0
h-index:
0
SHIMIZU, S
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1985,
32
(03)
:562
-570
[9]
A THEORETICAL-STUDY OF GATE DRAIN OFFSET IN LDD MOSFETS
[J].
LEE, J
论文数:
0
引用数:
0
h-index:
0
LEE, J
;
MAYARAM, K
论文数:
0
引用数:
0
h-index:
0
MAYARAM, K
;
HU, CM
论文数:
0
引用数:
0
h-index:
0
HU, CM
.
IEEE ELECTRON DEVICE LETTERS,
1986,
7
(03)
:152
-154
[10]
THE EFFECT OF HIGH FIELDS ON MOS DEVICE AND CIRCUIT PERFORMANCE
[J].
SODINI, CG
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,HOLMDEL,NJ 07733
SODINI, CG
;
KO, PK
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,HOLMDEL,NJ 07733
KO, PK
;
MOLL, JL
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,HOLMDEL,NJ 07733
MOLL, JL
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1984,
31
(10)
:1386
-1393
←
1
2
→