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AN ANALYTICAL 2-DIMENSIONAL SIMULATION FOR THE GAAS-MESFET DRAIN-INDUCED BARRIER LOWERING - A SHORT-CHANNEL EFFECT
被引:19
作者:
CHANG, CS
DAY, DYS
CHAN, S
机构:
[1] Avantek, Inc., Santa Clara
关键词:
D O I:
10.1109/16.108177
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
An analytic model is developed for simulating the GaAs MESFET drain-induced barrier lowering and its effect on the device performance. The potential barrier between the source and drain of a field-effect transistor in or near the subthreshold region is lowered by increasing the drain voltage. As the barrier is lowered to be comparable to the thermal energy, an appreciable current will flow through the channel, and the device will begin to conduct. This effect causes the threshold voltage control problem and degrades the device performance. © 1990 IEEE
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页码:1182 / 1186
页数:5
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