DOPANT-ENHANCED ABLATION OF NITROCELLULOSE BY A NITROGEN LASER

被引：9

作者：

KOSMIDIS, CE

SKORDOULIS, CD

机构：

[1] Atomic and Molecular Physics Laboratory, Department of Physics, University of Ioannina, Ioannina

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1993年 / 56卷 / 01期

关键词：

D O I：

10.1007/BF00351904

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The photoetching behavior of pure nitrocellulose and of nitrocellulose dyed with stilbene-420, coumarin-120 and rhodamine 6G by 337 nm nitrogen laser pulses has been studied. Ablation with a low power nitrogen laser is hereby reported for the first time. A two step photochemical mechanism is proposed to account for the ablation of the pure material. With the addition of dyes strongly absorbing at 337 nm the photoetching rate of nitrocellulose can be increased significantly. This increase is proportional to the molar extinction coefficient of the dye at 337 nm and its concentration in the polymer. The photoetching mechanism and the energy transfer processes from the dye to the polymer are discussed in detail.

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页码：64 / 68

页数：5

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