DEPTH RESOLUTION IN SPUTTER PROFILING - EVIDENCE AGAINST SEQUENTIAL LAYER SPUTTERING MODEL

被引:24
作者
WITTMAACK, K
SCHULZ, F
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D O I
10.1016/0040-6090(78)90144-X
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T [工业技术];
学科分类号
08 ;
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页码:259 / 270
页数:12
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