MEASUREMENT OF DIFFUSION-COEFFICIENT OF CF2 RADICAL IN DC PULSED CF4/H-2 DISCHARGE PLASMA

被引:5
作者
ARAI, T
GOTO, M
TAKAYAMA, D
SHIMIZU, T
MURAKAMI, M
HORIKOSHI, K
FUJIOKA, H
机构
[1] TOSHIBA LIGHTING & TECHNOL CORP,YOKOSUKA,KANAGAWA 237,JAPAN
[2] FUJITSU LABS LTD,NAKAHARA KU,KAWASAKI,KANAGAWA 211,JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1995年 / 34卷 / 10B期
关键词
ETCHING PLASMA; CF2; RADICAL; DIFFUSION COEFFICIENT; CF4/H-2; PLASMA; LASER-INDUCED FLUORESCENCE;
D O I
10.1143/JJAP.34.L1392
中图分类号
O59 [应用物理学];
学科分类号
摘要
Laser-induced fluorescence has been used to measure the CF2 radical ground-state densities after extinction of DC pulsed CF4/H-2 discharge plasma. From the measurement, the CF2 radical was shown to be removed mainly by a diffusion process. Its diffusion coefficients are found to be D=430 cm(2) . Torr . s(-1) in H-2 and D=65 cm(2) . Torr . s(-1) in CF4 at room temperature.
引用
收藏
页码:L1392 / L1394
页数:3
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