TRANSMISSION ELECTRON-MICROSCOPE STUDY OF THE GROWTH-KINETICS OF TISI2 EPITAXY ON (111)SI

被引：15

作者：

CHU, JJ

WU, IC

CHEN, LJ

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1987年 / 61卷 / 02期

关键词：

D O I：

10.1063/1.338256

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：549 / 551

页数：3

共 17 条

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APPLIED PHYSICS LETTERS, 1985, 46 (11) :1061-1063

[9] LOCALIZED EPITAXIAL-GROWTH OF TETRAGONAL AND HEXAGONAL WSI2 ON (111)SI [J].

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[10]

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