ION-BEAM-INDUCED ATOMIC MIXING AT THE SIO2-SI INTERFACE

被引：20

作者：

TSONG, IST ^{[1
]}

MONKOWSKI, JR ^{[1
]}

HOFFMAN, DW ^{[1
]}

机构：

[1] FORD MOTOR CO,DEARBORN,MI 48121

来源：

NUCLEAR INSTRUMENTS & METHODS | 1981年 / 182卷 / APR期

关键词：

D O I：

10.1016/0029-554X(81)90693-5

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：237 / 240

页数：4

共 22 条

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ANDERSEN, HH .

APPLIED PHYSICS, 1979, 18 (02) :131-140

[2] OPTICAL-PROPERTIES OF THE INTERFACE BETWEEN SI AND ITS THERMALLY GROWN OXIDE [J].

ASPNES, DE ;

THEETEN, JB .

PHYSICAL REVIEW LETTERS, 1979, 43 (14) :1046-1050

[3] SPUTTERING IN SURFACE ANALYSIS OF SOLIDS - DISCUSSION OF SOME PROBLEMS [J].

COBURN, JW .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (05) :1037-1044

[4]

FELDMAN LC, 1978, PHYSICS SIO2 ITS INT, P344

[5]

FRENZEL H, 1980, PHYSICS MOS INSULATO, P246

[6] ION-BEAM-INDUCED ATOMIC MIXING [J].

HAFF, PK ;

SWITKOWSKI, ZE .

JOURNAL OF APPLIED PHYSICS, 1977, 48 (08) :3383-3386

[7] LOW-ENERGY ION IMPACT PHENOMENA ON SINGLE-CRYSTAL SURFACES [J].

HARRISON, DE ;

KELLY, PW ;

GARRISON, BJ ;

WINOGRAD, N .

SURFACE SCIENCE, 1978, 76 (02) :311-322

[8] THEORETICAL TREATMENT OF CASCADE MIXING IN DEPTH PROFILING BY SPUTTERING [J].

HOFER, WO ;

LITTMARK, U .

PHYSICS LETTERS A, 1979, 71 (5-6) :457-460

[9] ANALYTIC CORRECTION OF EDGE EFFECTS IN ION-BEAM SPUTTERED DEPTH PROFILES [J].

HOFFMAN, DW ;

TSONG, IST ;

POWER, GL .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (02) :613-620

[10]

ISHITANI T, 1975, APPL PHYS, V6, P241, DOI 10.1007/BF00883758

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