COLOR-BAND GENERATION DURING HIGH DOSE ION-IMPLANTATION OF SILICON WAFERS

被引：5

作者：

BEANLAND, DG ^{[1
]}

CHIVERS, DJ ^{[1
]}

机构：

[1] AERE,DIV CHEM,HARWELL OX11 0RA,OXFORDSHIRE,ENGLAND

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1978年 / 125卷 / 08期

关键词：

D O I：

10.1149/1.2131673

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：1331 / 1338

页数：8

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