EVALUATION OF A NEW HIGH-CAPACITY, ALL-TANTALUM MOLECULAR-BEAM-EPITAXY ARSENIC CRACKER FURNACE

被引：13

作者：

SACKS, RN ^{[1
]}

EICHLER, DW ^{[1
]}

PASTORELLO, RA ^{[1
]}

COLOMBO, P ^{[1
]}

机构：

[1] EPI SYST,ST PAUL,MN 55101

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1990年 / 8卷 / 02期

关键词：

D O I：

10.1116/1.584847

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：168 / 171

页数：4

共 11 条

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