COMPARISON OF THE PROPERTIES OF MOLYBDENUM SILICIDE FILMS DEPOSITED BY DC MAGNETRON AND RF DIODE CO-DEPOSITION

被引：16

作者：

NOWICKI, RS

MOULDER, JF

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1981年 / 128卷 / 03期

关键词：

D O I：

10.1149/1.2127458

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：562 / 567

页数：6

共 15 条

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[9] SILICIDE FORMATION IN THIN CO-SPUTTERED (TITANIUM + SILICON) FILMS ON POLYCRYSTALLINE SILICON AND SIO2 [J].

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[10] PROPERTIES OF RF-SPUTTERED AL2O3 FILMS DEPOSITED BY PLANAR MAGNETRON [J].

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