LIGHT-ION SPUTTERING YIELD MEASUREMENTS OF TI AND TIC UNDER O-2 EXPOSURE AT HIGH-TEMPERATURE

被引：12

作者：

SANTANIELLO, A ^{[1
]}

APPELT, J ^{[1
]}

BOHDANSKY, J ^{[1
]}

ROTH, J ^{[1
]}

机构：

[1] INST NUCL STUDIES,PL-05480 OTWOCK SWIERK,POLAND

来源：

JOURNAL OF NUCLEAR MATERIALS | 1989年 / 162卷

关键词：

D O I：

10.1016/0022-3115(89)90392-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：951 / 956

页数：6

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