RAPID THERMAL NITRIDATION OF SIO2-FILMS

被引：10

作者：

ELFERINK, JBO ^{[1
]}

HABRAKEN, FHPM ^{[1
]}

VANDERWEG, WF ^{[1
]}

DOOMS, E ^{[1
]}

HEYNS, M ^{[1
]}

DEKEERSMAECKER, R ^{[1
]}

机构：

[1] IMEC VZW,B-3030 LOUVAIN,BELGIUM

来源：

APPLIED SURFACE SCIENCE | 1989年 / 39卷 / 1-4期

关键词：

D O I：

10.1016/0169-4332(89)90436-4

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

收藏

页码：219 / 226

页数：8

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