LONG-LIVED DRY-ETCHED ALGAAS/GAAS RIDGE WAVE-GUIDE LASER-DIODES

被引:5
作者
HARDING, CM
WATERS, RG
机构
关键词
D O I
10.1063/1.102959
中图分类号
O59 [应用物理学];
学科分类号
摘要
Chemically assisted ion beam etching has been utilized to fabricate ridge waveguide GaAs/AlGaAs lasers which are as reliable, if not more so, than their oxide stripe counterparts. Results on 60- and 5-μm-wide ridge waveguide lasers with 600 μm cavity lengths as compared to oxide stripe lasers with the same configuration are reviewed and multikilohour lifetimes are demonstrated.
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页码:2175 / 2176
页数:2
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共 11 条
  • [1] RECTANGULAR AND L-SHAPED GAAS/ALGAAS LASERS WITH VERY HIGH-QUALITY ETCHED FACETS
    BEHFARRAD, A
    WONG, SS
    BALLANTYNE, JM
    SOLTZ, BA
    HARDING, CM
    [J]. APPLIED PHYSICS LETTERS, 1989, 54 (06) : 493 - 495
  • [2] GAAS ALGAAS RIDGE WAVE-GUIDE LASER MONOLITHICALLY INTEGRATED WITH A PHOTODETECTOR USING ION-BEAM ETCHING
    BOUADMA, N
    GROSMAIRE, S
    BRILLOUET, F
    [J]. ELECTRONICS LETTERS, 1987, 23 (16) : 855 - 857
  • [3] CHEN YC, 1983, IEEE J QUANTUM ELECT, V19, P1092, DOI 10.1109/JQE.1983.1071993
  • [4] SIDEWALL DAMAGE IN N+-GAAS QUANTUM WIRES FROM REACTIVE ION ETCHING
    CHEUNG, R
    LEE, YH
    KNOEDLER, CM
    LEE, KY
    SMITH, TP
    KERN, DP
    [J]. APPLIED PHYSICS LETTERS, 1989, 54 (21) : 2130 - 2132
  • [5] CHEMICALLY ASSISTED ION-BEAM ETCHING OF GAAS, TI, AND MO
    CHINN, JD
    FERNANDEZ, A
    ADESIDA, I
    WOLF, ED
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (02): : 701 - 704
  • [6] MONOLITHIC TWO-DIMENSIONAL SURFACE-EMITTING ARRAYS OF GAAS/ALGAAS DIODE-LASERS
    DONNELLY, JP
    GOODHUE, WD
    WINDHORN, TH
    BAILEY, RJ
    LAMBERT, SA
    [J]. APPLIED PHYSICS LETTERS, 1987, 51 (15) : 1138 - 1140
  • [7] A NOVEL ANISOTROPIC DRY ETCHING TECHNIQUE
    GEIS, MW
    LINCOLN, GA
    EFREMOW, N
    PIACENTINI, WJ
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 1390 - 1393
  • [8] NOVEL PROCESS FOR INTEGRATION OF OPTOELECTRONIC DEVICES USING REACTIVE ION ETCHING WITHOUT CHLORINATED GAS
    HENRY, L
    VAUDRY, C
    GRANJOUX, P
    [J]. ELECTRONICS LETTERS, 1987, 23 (24) : 1253 - 1254
  • [9] DEFORMATION-FREE OVERGROWTH OF REACTIVE ION-BEAM ETCHED SUBMICRON STRUCTURES IN INP BY LIQUID-PHASE EPITAXY
    SCHILLING, M
    WUNSTEL, K
    [J]. APPLIED PHYSICS LETTERS, 1986, 49 (12) : 710 - 712
  • [10] HIGH-POWER ALGAAS/GAAS SINGLE QUANTUM-WELL LASERS WITH CHEMICALLY ASSISTED ION-BEAM ETCHED MIRRORS
    TIHANYI, P
    WAGNER, DK
    ROZA, AJ
    VOLLMER, HJ
    HARDING, CM
    DAVIS, RJ
    WOLF, ED
    [J]. APPLIED PHYSICS LETTERS, 1987, 50 (23) : 1640 - 1641