THE EFFECTS OF OXYGEN-ARGON MIXING ON PROPERTIES OF SPUTTERED SILICON DIOXIDE FILMS

被引:29
作者
SUYAMA, S
OKAMOTO, A
SERIKAWA, T
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D O I
10.1149/1.2100867
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
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页码:2260 / 2264
页数:5
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