BROMINE METHANOL POLISHING OF (100) INP SUBSTRATES

被引：7

作者：

CHIN, BH

BARLOW, KL

机构：

[1] AT&T Bell Lab, United States

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1988年 / 135卷 / 12期

关键词：

D O I：

10.1149/1.2095514

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：3120 / 3125

页数：6

共 20 条

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