THE DEVELOPMENT OF NON-UNIFORM DEPOSITION OF HOLES IN GATE OXIDES

被引:12
作者
FREITAG, RK [1 ]
BURKE, EA [1 ]
DOZIER, CM [1 ]
BROWN, DB [1 ]
机构
[1] MISSION RES CORP,NASHUA,NH 03062
关键词
' This work has been supported by the Defense Nuclear Agency through its Basic Mechanisms and Hardness Assurance programs;
D O I
10.1109/23.25440
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:1203 / 1207
页数:5
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