MICROPROBE USING FOCUSED 1.5 MEV HELIUM ION AND PROTON-BEAMS

被引：25

作者：

KINOMURA, A ^{[1
]}

TAKAI, M ^{[1
]}

INOUE, K ^{[1
]}

MATSUNAGA, K ^{[1
]}

IZUMI, M ^{[1
]}

MATSUO, T ^{[1
]}

GAMO, K ^{[1
]}

NAMBA, S ^{[1
]}

SATOU, M ^{[1
]}

机构：

[1] GOVT IND RES INST,IKEDA,OSAKA 563,JAPAN

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1988年 / 33卷 / 1-4期

关键词：

D O I：

10.1016/0168-583X(88)90700-8

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：862 / 866

页数：5

共 10 条

[1]

Chu W. K., 1978, BACKSCATTERING SPECT

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[8] FOCUSED MEV BEAM LINE FOR MICROANALYSIS AT OSAKA [J].

TAKAI, M ;

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INOUE, K ;

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NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1988, 30 (03) :260-264

[9] EFFECTS OF IMPLANTATION TEMPERATURE ON LATTICE LOCATION OF TELLURIUM IMPLANTED IN GALLIUM-ARSENIDE [J].

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