PTSI CONTACT METALLURGY USING SPUTTERED PT AND DIFFERENT ANNEALING PROCESSES

被引：5

作者：

CHANG, CA ^{[1
]}

SEGMULLER, A ^{[1
]}

HUANG, HCW ^{[1
]}

CUNNINGHAM, B ^{[1
]}

TURENE, FE ^{[1
]}

SUGERMAN, A ^{[1
]}

TOTTA, PA ^{[1
]}

机构：

[1] IBM CORP,E FISHKILL FACIL,HOPEWELL JUNCTION,NY 12533

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1986年 / 133卷 / 06期

关键词：

D O I：

10.1149/1.2108830

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1256 / 1260

页数：5

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