共 10 条
[1]
ACTIVATED REACTIVE EVAPORATION PROCESS FOR HIGH RATE DEPOSITION OF COMPOUNDS
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1972, 9 (06)
:1385-&
[5]
Korhonen A. S., 1988, Surface Engineering, V4, P44
[6]
TI-N PHASES FORMED BY REACTIVE ION PLATING
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1985, 3 (06)
:2419-2425
[7]
EFFECT OF SUBSTRATE TEMPERATURE ON STRUCTURE OF TITANIUM CARBIDE DEPOSITED BY ACTIVATED REACTIVE EVAPORATION
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1972, 9 (06)
:1389-&
[9]
PROCESS-CONTROL WITH OPTICAL-EMISSION SPECTROSCOPY IN TRIODE ION PLATING
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1985, 3 (06)
:2364-2367