METAL INDUCED CRYSTALLIZATION OF AMORPHOUS-SILICON

被引:27
作者
ROBERTSON, AE [1 ]
HULTMAN, LG [1 ]
HENTZELL, HTG [1 ]
HORNSTROM, SE [1 ]
SHAOFANG, G [1 ]
PSARAS, PA [1 ]
机构
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1987年 / 5卷 / 04期
关键词
D O I
10.1116/1.574618
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:1447 / 1450
页数:4
相关论文
共 11 条
[1]   HIGH-TEMPERATURE METAL-INDUCED CRYSTALLIZATION OF RF SPUTTERED AMORPHOUS SI THIN-FILMS [J].
GREENE, JE ;
MEI, L .
THIN SOLID FILMS, 1976, 37 (03) :429-440
[2]  
HERD SR, 1972, J NONCRYSTAL SOLIDS, V7, P309, DOI DOI 10.1016/0022-3093(72)90267-0
[3]   ROOM-TEMPERATURE INTERFACIAL REACTION IN AU-SEMICONDUCTOR SYSTEMS [J].
HIRAKI, A ;
SHUTO, K ;
KIM, S ;
KAMMURA, W ;
IWAMI, M .
APPLIED PHYSICS LETTERS, 1977, 31 (09) :611-612
[4]  
HULTMAN LG, UNPUB J APPL PHYS
[5]   NOBLE-METAL SI(111) INTERFACES STUDIED BY MEV ION-SCATTERING [J].
ITO, T ;
GIBSON, WM .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1984, 2 (02) :561-565
[6]   ION-BEAM-INDUCED REACTIONS IN METAL-SEMICONDUCTOR AND METAL-METAL THIN-FILM STRUCTURES [J].
MAYER, JW ;
TSAUR, BY ;
LAU, SS ;
HUNG, LS .
NUCLEAR INSTRUMENTS & METHODS, 1981, 182 (APR) :1-13
[7]   INTERACTION OF METAL LAYERS WITH POLYCRYSTALLINE SI [J].
NAKAMURA, K ;
OLOWOLAFE, JO ;
LAU, SS ;
NICOLET, MA ;
MAYER, JW ;
SHIMA, R .
JOURNAL OF APPLIED PHYSICS, 1976, 47 (04) :1278-1283
[8]   CHEMICAL PROFILING AND STRUCTURAL STUDIES OF ION BEAM-MIXED ALUMINUM ON SILICON [J].
NAMAVAR, F ;
BUDNICK, JI ;
OTTER, FA .
THIN SOLID FILMS, 1983, 104 (1-2) :31-41
[9]   SCHOTTKY-BARRIER AMORPHOUS CRYSTALLINE INTERFACE FORMATION [J].
THOMPSON, MJ ;
NEMANICH, RJ ;
TSAI, CC .
SURFACE SCIENCE, 1983, 132 (1-3) :250-263
[10]   NEW SURFACE-STRUCTURE ANALYSIS OF AG-SI PHASE BY QUANTITATIVE AUGER-ELECTRON SPECTROSCOPY METHOD [J].
TOKUTAKA, H ;
NISHIMORI, K ;
NOMURA, S ;
TANAKA, A ;
TAKASHIMA, K .
SURFACE SCIENCE, 1982, 115 (01) :79-90