ELECTRON-PARAMAGNETIC RESONANCE STUDY ON THE ANNEALING BEHAVIOR OF VACUUM-DEPOSITED AMORPHOUS-SILICON ON CRYSTALLINE SILICON

被引：22

作者：

OHDOMARI, I ^{[1
]}

KAKUMU, M ^{[1
]}

SUGAHARA, H ^{[1
]}

HORI, M ^{[1
]}

SAITO, T ^{[1
]}

YONEHARA, T ^{[1
]}

HAJIMOTO, Y ^{[1
]}

机构：

[1] CANON INC,CTR RES & DEV,MEGURO KU,TOKYO,JAPAN

来源：

JOURNAL OF APPLIED PHYSICS | 1981年 / 52卷 / 11期

关键词：

D O I：

10.1063/1.328615

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：6617 / 6622

页数：6

共 16 条

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