VALIDATION OF THE CHARGE PUMPING METHOD DOWN TO LIQUID-HELIUM TEMPERATURE

被引:1
作者
NGUYENDUC, C
GHIBAUDO, G
BALESTRA, F
机构
[1] Laboratoire de Physique des Composants à Semiconducteurs, associé au C.N.R.S. No. 84, Grenoble
来源
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1991年 / 126卷 / 02期
关键词
D O I
10.1002/pssa.2211260237
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
[No abstract available]
引用
收藏
页码:K139 / K142
页数:4
相关论文
共 9 条
[1]   CHARGE PUMPING IN MOS DEVICES [J].
BRUGLER, JS ;
JESPERS, PGA .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1969, ED16 (03) :297-+
[2]   CHARGE PUMPING IN SILICON ON INSULATOR STRUCTURES USING GATED P-I-N-DIODES [J].
ELEWA, T ;
HADDARA, H ;
CRISTOLOVEANU, S ;
BRUEL, M .
JOURNAL DE PHYSIQUE, 1988, 49 (C-4) :137-140
[3]   USE OF CHARGE PUMPING CURRENTS TO MEASURE SURFACE STATE DENSITIES IN MOS-TRANSISTORS [J].
ELLIOT, ABM .
SOLID-STATE ELECTRONICS, 1976, 19 (03) :241-247
[4]   INVESTIGATION OF THE CHARGE PUMPING CURRENT IN METAL-OXIDE-SEMICONDUCTOR STRUCTURES [J].
GHIBAUDO, G ;
SAKS, NS .
JOURNAL OF APPLIED PHYSICS, 1989, 65 (11) :4311-4318
[5]   A RELIABLE APPROACH TO CHARGE-PUMPING MEASUREMENTS IN MOS-TRANSISTORS [J].
GROESENEKEN, G ;
MAES, HE ;
BELTRAN, N ;
DEKEERSMAECKER, RF .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1984, 31 (01) :42-53
[6]   PROFILING OF STRESS-INDUCED INTERFACE STATES IN SHORT CHANNEL MOSFETS USING A COMPOSITE CHARGE PUMPING TECHNIQUE [J].
HADDARA, H ;
CRISTOLOVEANU, S .
SOLID-STATE ELECTRONICS, 1986, 29 (08) :767-772
[7]   EVALUATION OF CHANNEL HOT CARRIER EFFECTS IN N-MOS TRANSISTORS AT 77-K WITH THE CHARGE PUMPING TECHNIQUE [J].
HEREMANS, P ;
SUN, YC ;
GROESENEKEN, G ;
MAES, HE .
APPLIED SURFACE SCIENCE, 1987, 30 (1-4) :313-318
[8]  
HEREMANS P, 1990, THESIS LEUVEN U, pCH6
[9]   A NEW CHARGE PUMPING METHOD OF MEASURING SI-SIO2 INTERFACE STATES [J].
TSENG, WL .
JOURNAL OF APPLIED PHYSICS, 1987, 62 (02) :591-599