INTERFACIAL REACTIONS OF COBALT THIN-FILMS ON BF2+ ION-IMPLANTED (001) SILICON

被引：26

作者：

LUR, W

CHEN, LJ

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1988年 / 64卷 / 07期

关键词：

D O I：

10.1063/1.341487

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3505 / 3511

页数：7

共 35 条

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