STUDY OF THE DX CENTER FINE-STRUCTURE IN ION-IMPLANTED AL0.27GA0.73AS PROCESSED BY RAPID THERMAL ANNEALING

被引：3

作者：

CAMPBELL, AC

DODABALAPUR, A

CROOK, GE

STREETMAN, BG

机构：

来源：

APPLIED PHYSICS LETTERS | 1989年 / 54卷 / 08期

关键词：

D O I：

10.1063/1.100874

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：727 / 729

页数：3

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