GAS-PHASE COMPOSITION CONSIDERATIONS IN THERMAL-OXIDATION OF SILICON IN CL-H-O AMBIENTS

被引：19

作者：

TRESSLER, RE

STACH, J

METZ, DM

机构：

[1] PENN STATE UNIV,DEPT MAT SCI,UNIVERSITY PK,PA 16802

[2] PENN STATE UNIV,DEPT ELECT ENGN,UNIVERSITY PK,PA 16802

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1977年 / 124卷 / 04期

关键词：

D O I：

10.1149/1.2133358

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：607 / 609

页数：3

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