HIGH-RATE SPUTTER DEPOSITION OF WEAR RESISTANT TANTALUM COATINGS

被引:38
作者
MATSON, DW
MERZ, MD
MCCLANAHAN, ED
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1992年 / 10卷 / 04期
关键词
D O I
10.1116/1.577748
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The refractory nature and high ductility of body centered cubic (bcc) phase tantalum makes it a suitable material for corrosion- and wear-resistant coatings on surfaces that are subjected to high stresses and harsh chemical and erosive environments. Sputter deposition can produce thick tantalum films but is prone to forming the brittle tetragonal beta phase of this material. Efforts aimed at forming thick bcc phase tantalum coatings in both flat plate and cylindrical geometries by high-rate triode sputtering methods are discussed. In addition to substrate temperature, the bcc-to-beta phase ratio in sputtered tantalum coatings is shown to be sensitive to other substrate surface effects.
引用
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页码:1791 / 1796
页数:6
相关论文
共 20 条
[1]   PLASMA INFLUENCE IN TANTALUM SPUTTERING [J].
CHOUAN, Y ;
COLLOBERT, D .
JOURNAL OF APPLIED PHYSICS, 1977, 48 (06) :2274-2279
[2]   NEW STRUCTURE OF SPUTTERED TANTALUM [J].
DAS, G .
THIN SOLID FILMS, 1972, 12 (02) :305-&
[3]   NUCLEATION OF BODY-CENTERED-CUBIC TANTALUM FILMS WITH A THIN NIOBIUM UNDERLAYER [J].
FACE, DW ;
PROBER, DE .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (06) :3408-3411
[4]   FACTORS CONTROLLING STRUCTURE OF SPUTTERED TA FILMS [J].
FEINSTEIN, LG ;
HUTTEMANN, RD .
THIN SOLID FILMS, 1973, 16 (02) :129-145
[5]   STRUCTURAL-CHANGES OF EVAPORATED TANTALUM DURING FILM GROWTH [J].
HIEBER, K ;
MAYER, NM .
THIN SOLID FILMS, 1982, 90 (01) :43-50
[6]  
HUTTEMANN RD, 1977, JPN J APPL PHYS PT 1, V2, P513
[7]   PREPARATION AND CORROSION PROPERTIES OF A TANTALUM SPUTTERED THICK-FILM [J].
KASHU, S ;
HAYASHI, C ;
SANO, T .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (06) :1399-&
[8]   STRUCTURE MODIFICATION BY ION-BOMBARDMENT DURING DEPOSITION [J].
MATTOX, DM ;
KOMINIAK, GJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (01) :528-&
[9]  
Mills D. J, 1966, J CAN CERAM SOC, V35, P48
[10]   PHASE FORMING PROCESSES IN TANTALUM FILMS THROUGH SPUTTERING [J].
NAKAMURA, M ;
FUJIMORI, M ;
NISHIMURA, Y .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1970, 9 (05) :557-+