FUNDAMENTALS OF CHEMICAL VAPOR-DEPOSITION

[21] THERMODYNAMIC AND EXPERIMENTAL ASPECTS OF GALLIUM ARSENIDE VAPOR GROWTH [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1970, 117 (07) : 932 - &

[22] BOWMAN MG, 1962, TID7653 USAEC RES 2

[23] PRODUCING EXTENDED AREA DEPOSITS OF UNIFORM THICKNESS BY A NEW CHEMICAL VAPOR-DEPOSITION TECHNIQUE [J]. JOURNAL OF CRYSTAL GROWTH, 1976, 35 (03) : 257 - 261

[24] FACTORS AFFECTING ADHERENCE OF CHEMICALLY VAPOR-DEPOSITED COATINGS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (04): : 719 - 724

[25] CHEMICALLY VAPOR-DEPOSITED TUNGSTEN, GRAIN-REFINED AND STABILIZED [J]. JOURNAL OF THE LESS-COMMON METALS, 1976, 45 (01): : 37 - 44

[26] KINETICS OF CHEMICAL VAPOR-DEPOSITION OF TUNGSTEN [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (04) : 559 - 565

[27] HIGH-TEMPERATURE STRENGTH STABILITY OF 3 FORMS OF CHEMICALLY VAPOR-DEPOSITED TUNGSTEN [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (04): : 695 - 699

[28] BRYANT WA, 1971, THESIS U PITTSBURGH

[29] BRYANT WA, 1975, THESIS U PITTSBURGH

[30] VAPOUR PHASE DEPOSITION OF METALS AND THEIR COMPOUNDS - APPLICATIONS IN ELECTRONICS [J]. MICROELECTRONICS RELIABILITY, 1967, 6 (03) : 231 - &

[21] THERMODYNAMIC AND EXPERIMENTAL ASPECTS OF GALLIUM ARSENIDE VAPOR GROWTH [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1970, 117 (07) : 932 - &

[22] BOWMAN MG, 1962, TID7653 USAEC RES 2

[23] PRODUCING EXTENDED AREA DEPOSITS OF UNIFORM THICKNESS BY A NEW CHEMICAL VAPOR-DEPOSITION TECHNIQUE [J]. JOURNAL OF CRYSTAL GROWTH, 1976, 35 (03) : 257 - 261

[24] FACTORS AFFECTING ADHERENCE OF CHEMICALLY VAPOR-DEPOSITED COATINGS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (04): : 719 - 724

[25] CHEMICALLY VAPOR-DEPOSITED TUNGSTEN, GRAIN-REFINED AND STABILIZED [J]. JOURNAL OF THE LESS-COMMON METALS, 1976, 45 (01): : 37 - 44

[26] KINETICS OF CHEMICAL VAPOR-DEPOSITION OF TUNGSTEN [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (04) : 559 - 565

[27] HIGH-TEMPERATURE STRENGTH STABILITY OF 3 FORMS OF CHEMICALLY VAPOR-DEPOSITED TUNGSTEN [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (04): : 695 - 699

[28] BRYANT WA, 1971, THESIS U PITTSBURGH

[29] BRYANT WA, 1975, THESIS U PITTSBURGH

[30] VAPOUR PHASE DEPOSITION OF METALS AND THEIR COMPOUNDS - APPLICATIONS IN ELECTRONICS [J]. MICROELECTRONICS RELIABILITY, 1967, 6 (03) : 231 - &