AN ELECTRON-CYCLOTRON RESONANCE PLASMA DEPOSITION TECHNIQUE EMPLOYING MAGNETRON MODE SPUTTERING

被引：47

作者：

TAKAHASHI, C

KIUCHI, M

ONO, T

MATSUO, S

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1988年 / 6卷 / 04期

关键词：

D O I：

10.1116/1.575588

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

收藏

页码：2348 / 2352

页数：5

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